Category | Assignment | Subject | Engineering |
---|---|---|---|
University | The University of Western Australia | Module Title | ELEC5508 Wireless Engineering |
(a)Use the velocity-field relations for Si and GaAs shown in Figure 1 to determine the transit time of electrons through a 1 µm distance in these materials for an electric field of (i) 1 kV/cm (ii) 50 kV/cm
(b)Assume that a conduction electron in Si (µn = 1350 cm2/V-s) has a thermal energy kT, related to its mean thermal velocity by Eth= m0vth 2 /2
(i)This electron is placed in an electric field of 100 V/cm. Show that the drift velocity of the electron in this case is small compared to its thermal velocity
(ii)Repeat for a field of 104 V/cm, using the same value of µn . Comment on the actual mobility effects at this higher value of field.
(a)Find the maximum percentage of In, that is, the x value for InxG1-x As film grown on GaAs substrate without formation of misfit dislocation, if the final film thickness is 10 nm.
(b)The lattice misfit, ƒ, of a film is defined as
ƒ≡ [a0s- a0f]/a0f= βa0/a 0
where a0sand a0f are the unstrained lattice constants of the substrate and film, respectively. Find the ƒvalues for InAs-GaAs and Ge-Si systems. (You may assume they are listed as film-substrate.)
(a)The built-in voltage for a p-n heterojunction can be given by: ππππππππ=βπΈπΈπ£π£ +ππππππππ οΏ½ππ ππ0ππππ0βππ π£π£ππ ππ π£π£ππ οΏ½ where pp0and pn0 are the thermal equilibrium hole concentrations in the p and n materials, respectively and Nvnand Nvp are the effective density of states functions in the n and p materials, respectively.
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